Non-porous diffusion furnace components

Details Non-porous diffusion furnace components Non-porous diffusion furnace components

1989-11-13

1994-02-01

Robinson, Ellis P.

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Web or sheet containing structurally defined element or...

Adhesive outermost layer

428 345, 428331, 428404, 428241, 428242, 432253, 432258, 432259, F27D 500, F16L 5900

Patent

active

052830896

ABSTRACT:
Components for semiconductor diffusion furnaces are constructed of a high purity impervious silicon carbide or silicon nitride matrix deposited onto and within a pre-shaped fibrous matrix of silicon carbide or silicon nitride which contains sufficient nucleation aids to produce a structure having a density greater than about 85% of theoretical density. The impregnation of the matrix material into the fibrous reinforcement prevents undesired gaseous components from contaminating the atmosphere of the furnace, and the fibrous reinforcement provides strength combined with light weight.

REFERENCES:
patent: 4761134 (1988-08-01), Foster

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