Metal deforming – By application of fluent medium – or energy field – Using fixed die
Reexamination Certificate
2009-05-29
2011-10-18
Jones, David (Department: 3725)
Metal deforming
By application of fluent medium, or energy field
Using fixed die
C072S347000, C076S107100, C204S298120, C204S298090
Reexamination Certificate
active
08037727
ABSTRACT:
A non-planar sputter target having differing crystallographic orientations in portions of the sputter target surface that promote more desirable deposition and density patterns of material sputtered from the target surface onto a substrate. A closed dome end of the sputter target is comprised of a first crystallographic orientation and sidewalls of the sputter target are comprised of a crystallographic orientation different from that of the dome. The sputter target is formed, preferably by hydroforming or other metal working techniques, in the absence of annealing. The hydroforming manipulations result in the different crystallographic orientations while minimizing, or ideally omitting, the application of heat. Quick and cost effective non-planar sputter targets that are easily repeatably producable are achievable as a result.
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Bailey Robert S.
Holcomb Melvin K.
Smathers David B.
Wiemels Timothy
Jones David
Tosoh SMD, Inc.
Wegman Hessler & Vanderburg
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