Non-photosensitive aqueous blockout composition and blockout met

Details Non-photosensitive aqueous blockout composition and blockout met Non-photosensitive aqueous blockout composition and blockout met

1995-05-26

1997-08-05

Chu, John S.

Coating processes

Restoring or repairing

427284, 427287, 427340, 427341, 525203, 524516, 101114, B32B 3500

Patent

active

056540329

ABSTRACT:
The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.

REFERENCES:
patent: 2811510 (1957-10-01), Leubner et al.
patent: 3507846 (1970-04-01), Haas
patent: 3936429 (1976-02-01), Seoka et al.
patent: 4220700 (1980-09-01), McGuckin et al.
patent: 4245027 (1981-01-01), Takeda et al.
patent: 4477552 (1984-10-01), Day et al.
patent: 4515886 (1985-05-01), Yamaoka et al.
patent: 4542088 (1985-09-01), Kojima et al.
patent: 4632897 (1986-12-01), Barzynski et al.
patent: 4701402 (1987-10-01), Patel et al.
patent: 5334485 (1994-08-01), Van Iseghem et al.
patent: 5506089 (1996-04-01), Gybin et al.
Chiang, et al., "Synthesis of Some Stilbazole Derivatives", Journal of Organic Chemistry, vol. X, pp. 21-25 (1945).
Ichimura, et al., "Immobilization of Enzymes with Use of Photosensitive Polymers Having the Stilbazolium Group", Journal of Polymer Science: Polymer Chemistry Edition, vol. 18, pp. 891-902 (1980).

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