Non-photolithographic etch mask for submicron features

Details Non-photolithographic etch mask for submicron features Non-photolithographic etch mask for submicron features

1997-07-23

1998-09-22

Kunemund, Robert

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

Resist material applied in particulate form or spray

216 11, 216 49, H01L 21302

Patent

active

058110208

ABSTRACT:
A non-photlithographic, physical patterning process, which is useful for selectively etching of a substrate, is provided. The process comprises electrostatically charging liquid droplets which are selectively etchable with respect to the substrate, dispersing the droplets onto substrate in a pattern; and etching the substrate using the droplets as a mask.

REFERENCES:
patent: 3665241 (1972-05-01), Spindt et al.
patent: 3755704 (1973-08-01), Spindt et al.
patent: 3812559 (1974-05-01), Spindt et al.
patent: 3814968 (1974-06-01), Nathanson et al.
patent: 4407695 (1983-10-01), Deckman et al.
patent: 4513308 (1985-04-01), Greene et al.
patent: 4566935 (1986-01-01), Hornbeck
patent: 4685996 (1987-08-01), Busta et al.
patent: 4766340 (1988-08-01), Van der Mast et al.
patent: 4806202 (1989-02-01), Tang et al.
patent: 4940916 (1990-07-01), Borel et al.
patent: 4968382 (1990-11-01), Jacobson et al.
patent: 4992699 (1991-02-01), McClure et al.
patent: 5064396 (1991-11-01), Spindt et al.
patent: 5083958 (1992-01-01), Longo et al.
patent: 5186670 (1993-02-01), Doan et al.
patent: 5201992 (1993-04-01), Marcus et al.
patent: 5220725 (1993-06-01), Chan et al.
patent: 5221221 (1993-06-01), Okaniwa
patent: 5228877 (1993-07-01), Allaway et al.
patent: 5229171 (1993-07-01), Donovan et al.
patent: 5229331 (1993-07-01), Doan et al.
patent: 5266530 (1993-11-01), Bagley et al.
patent: 5302238 (1994-04-01), Roe et al.
patent: 5391259 (1995-02-01), Cathey et al.
patent: 5411630 (1995-05-01), Nagase et al.
patent: 5510156 (1996-04-01), Zhao
K. Kim and C.K. Ryu, "Generation of Charged Liquid Cluster Beam of Liquid-Mix Precursors and Application to Nanostructured Materials", Nanostructured Materials, vol. 4, No. 5, pp. 597-602, 1994.
Marcus et al., "Formation of Silicon Tips with 1 nm Radius", Appl. Physics Letter, vol. 56, No. 3, Jan. 15, 1990 pp. 236-238.
Hunt et al., "Structure and Electrical Characteristics of Silicon Field-Emission Microelectronic Devices", IEEE Transactions on Electron Devices, vol. 38, No. 10, Oct. 1991 pp. 2309-2313.
McGruer et al., "Oxidation-Sharpened Gated Field Emitter Array Process", IEEE Transactions on Electron Devices, vol. 38, No. 10, Oct. 1991 pp. 2389-2391.
R.Z. Bakhitzin et al., "GaAs Field Emitter Array", IEEE Transactions on Electron Devices, vol. 8, No. 10, Oct. 1991, pp. 2398-2400.
R.N. Thomas et al., "Fabrication and Some Applications of Large-Area Silicon Field Emission Arrays", Solid-State Electronics, vol. 17, 1974, pp. 155-163.

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