Non-photolithographic etch mask for submicron features

Details Non-photolithographic etch mask for submicron features Non-photolithographic etch mask for submicron features

1996-03-07

1997-12-09

Breneman, R. Bruce

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

Resist material applied in particulate form or spray

216 49, 216 11, 15665911, 427534, B44C 122, B05D 100

Patent

active

056956584

ABSTRACT:
A non-photolithographic, physical patterning process, which is useful for selectively etching of a substrate, is provided. The process comprises electrostatically charging liquid droplets which are selectively etchable with respect to the substrate, dispersing the droplets onto substrate in a pattern; and etching the substrate using the droplets as a mask.

REFERENCES:
patent: 3665241 (1972-05-01), Spindt et al.
patent: 3755704 (1973-08-01), Spindt et al.
patent: 3812559 (1974-05-01), Spindt et al.
patent: 3814968 (1974-06-01), Nathanson et al.
patent: 4407695 (1983-10-01), Deckman et al.
patent: 4513308 (1985-04-01), Greene et al.
patent: 4566935 (1986-01-01), Hornbeck
patent: 4685996 (1987-08-01), Busta et al.
patent: 4766340 (1988-08-01), Van der Mast et al.
patent: 4806202 (1989-02-01), Tang et al.
patent: 4940916 (1990-07-01), Borel et al.
patent: 4968382 (1990-11-01), Jacobson et al.
patent: 4992699 (1991-02-01), McClure et al.
patent: 5064396 (1991-11-01), Spindt et al.
patent: 5083958 (1992-01-01), Longo et al.
patent: 5186670 (1993-02-01), Doan et al.
patent: 5201992 (1993-04-01), Marcus et al.
patent: 5220725 (1993-06-01), Chan et al.
patent: 5221221 (1993-06-01), Okaniwa
patent: 5228877 (1993-07-01), Allaway et al.
patent: 5229171 (1993-07-01), Donovan et al.
patent: 5229331 (1993-07-01), Doan et al.
patent: 5266530 (1993-11-01), Bagley et al.
patent: 5302238 (1994-04-01), Roe et al.
patent: 5312514 (1994-05-01), Kumar
patent: 5391259 (1995-02-01), Cathey et al.
patent: 5399238 (1995-03-01), Kumar
patent: 5510156 (1996-04-01), Zhao
Marcus et al., "Formation of Silicon Tips with 1 nm Radius", Appl. Physics Letter, vol. 56, No. 3, Jan. 15, 1990.
Hunt et al., "Structure and Electrical Characteristics of Silicon Field-Emission Microelectronic Devices", IEEE Transaction on Electron Devices, vol. 38, No. 10, Oct. 1991.
McGruer et al., "Oxidation-Sharpened Gated Field Emitter Array Process", IEEE Transactions on Electron Devices, vol. 38, No. 10, Oct. 1991.
Keiichi Betsui "Fabrication and Characteristics of Si Field Emitter Arrays" 1991, Fujitsu Laboratories, pp. 26-29.
R. Z. Bakhtizin, S. S. Ghots, and E. K. Ratnikova, "GaAs Field Emitter Array", IEEE TRansactions On Electron Devices, vol. #8, No. 10, Oct. 1991, pp. 2398-2400.
R. N. Thomas, R. A. Wickstrom, D. K. Schroder, and H. C. Nathanson, "Fabrication and Some Applications of Large-Area Silicon Field Emission Arrays", Solid-State Electronics, vol. 17, 1974, pp. 155-163.
Kim et al., "Generation of Charged Liquid Cluster Beam of Liquid Mix Precursors and Application to Nanostructured Materials", Nanostructured Materials, vol. 4, No. 5, pp. 597-602, 1994.

Affiliated with

Also associated with

Rating

Non-photolithographic etch mask for submicron features does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non-photolithographic etch mask for submicron features, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-photolithographic etch mask for submicron features will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1604794