Non-magnetic sputtering target

Details Non-magnetic sputtering target Non-magnetic sputtering target

1984-10-09

1986-07-01

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

045978476

ABSTRACT:
A composite sputtering target is provided which is constructed of a non-magnetic sputtering material bonded to a magnetic backing material. A magnetic field is provided through the backing material by a magnetic system, so that the backing material and magnetic system form a closed flux path. During sputtering the magnetic system is operated at a high enough field strength to saturate the backing plate. This saturation causes a fringing field over the non-magnetic target similar to that obtained with magnetic target systems. In another embodiment, the return path for magnetic flux beneath the target material is a permanent part of the magnetic system instead of being permanently attached to the target material as a backing for support.

REFERENCES:
patent: 3620957 (1971-11-01), Crawley et al.
patent: 3669871 (1972-06-01), Elmgren et al.
patent: 3956093 (1976-05-01), McLeod
patent: 4060470 (1977-11-01), Clarke
patent: 4135286 (1979-01-01), Wright et al.
patent: 4162954 (1979-07-01), Morrison, Jr.
patent: 4169031 (1979-09-01), Brors
patent: 4180450 (1979-12-01), Morrison, Jr.
patent: 4194962 (1980-03-01), Chambers et al.
patent: 4198283 (1980-04-01), Class et al.
patent: 4200510 (1980-04-01), O'Connell et al.
patent: 4204936 (1980-05-01), Hartsough
patent: 4209375 (1980-06-01), Gates et al.
patent: 4219397 (1980-08-01), Clarke
patent: 4239611 (1980-12-01), Morrison, Jr.
patent: 4265729 (1981-05-01), Morrison, Jr.
patent: 4282083 (1981-08-01), Kertesz et al.
patent: 4299678 (1981-11-01), Meckel
patent: 4309266 (1982-01-01), Nakamura et al.
patent: 4312731 (1982-01-01), Morrison, Jr.
patent: 4324631 (1982-04-01), Meckel et al.
patent: 4341816 (1982-07-01), Lauterbach et al.
patent: 4361472 (1982-11-01), Morrison, Jr.
patent: 4370217 (1983-01-01), Funaki
patent: 4389299 (1983-06-01), Adachi et al.
patent: 4391697 (1983-07-01), Morrison, Jr.
patent: 4392939 (1983-07-01), Crombeen et al.
patent: 4401539 (1983-08-01), Abe
patent: 4401546 (1983-08-01), Nakamura et al.
patent: 4405436 (1983-09-01), Kobayashi et al.
patent: 4414086 (1983-11-01), Lamont, Jr.
patent: 4417968 (1983-11-01), McKelvey
patent: 4421628 (1983-12-01), Quaderer
patent: 4431505 (1984-02-01), Morrison
patent: 4461688 (1984-07-01), Morrison
patent: 4466877 (1984-08-01), McKelvey

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