Non-invasive wafer transfer position diagnosis and calibration

Optics: measuring and testing – By alignment in lateral direction – With light detector

Reexamination Certificate

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C356S620000

Reexamination Certificate

active

06965432

ABSTRACT:
An apparatus and method for detecting mispositioned wafers attributable to transfer shift of the wafer are disclosed. A calibration wafer has a target region comprising a pattern of optically distinguishable features from which is determined the position of the calibration wafer within the chamber subsequent to its transfer therein. Preferably, the features comprise a pattern of colors that can be detected by spectroscopy. A preferred form and manner of providing such color features is by way of dielectric thin film filters.

REFERENCES:
patent: 5955654 (1999-09-01), Stover et al.
patent: 6420892 (2002-07-01), Krivy et al.
patent: 6559456 (2003-05-01), Muraki
patent: 6684172 (2004-01-01), Subramanian et al.
patent: 2002/0018217 (2002-02-01), Weber-Grabau et al.

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