Non-destructive semiconductor wafer test system

Details Non-destructive semiconductor wafer test system Non-destructive semiconductor wafer test system

1998-07-28

2000-10-03

Williams, Hezron

Measuring and testing

Gas analysis

Gas chromatography

73 2341, 73 1902, 422 89, 95 87, 96101, 436161, B01D 1508, G01N 3008

Patent

active

061256897

ABSTRACT:
The invention provides methods and systems for identifying compounds released from a semi-conductor wafer. Compounds are released from the wafer by subjecting the wafer to a rapid temperature excursion in a very low pressure chamber. The released compounds are often isolated using gas chromatography. Diffusion between the layers of a multiple layer semi-conductor structure can be minimized by directly heating a target surface of the wafer using radiant heating.

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Product Brochure from Finningan Corporation, GCQ GC/MS System/GCQ Tandem GC/MS/MS System.

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