Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1998-05-21
2000-02-01
Gupta, Yogendra
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510176, 510255, 510259, 510264, 510504, 134 2, 134 38, 134 41, 134 42, C11D 732, C11D 760
Patent
active
060202920
ABSTRACT:
A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.
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Honda Kenji
Maw Taishih
Delcotto Gregory R.
Gupta Yogendra
Olin Microelectronic Chemicals, Inc.
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