Non-corrosive cleaning composition for removing plasma etching r

Details Non-corrosive cleaning composition for removing plasma etching r Non-corrosive cleaning composition for removing plasma etching r

1996-09-06

1998-10-06

McGinty, Douglas J.

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

510175, 510255, 510259, 510504, C11D 726, C11D 732, C11D 760

Patent

active

058176101

ABSTRACT:
A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.

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"Thin Film Pitting: Is NMP the Culprit?", by Dr. Franco T. Lee, Dr. David R. Wanlass and B. Walsh, appearing in Semiconductor International, Jun. 1994.

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