Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1998-12-31
2000-08-15
Krynski, William
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510175, 510212, 510255, 510258, 510434, 510477, 510499, 134 11, 134 13, C11D 330, C11D 343, B08B 308
Patent
active
061036803
ABSTRACT:
Non-corrosive cleaning compositions that are useful for removing photoresist and/or plasma etch residues from a substrate. The cleaning composition comprises: (i) a hydroxy-(lower alkyl)-hydrazine, (ii) water, and (iii) at least one compound selected from the group consisting of a carboxylic acid, a water-miscible organic solvent and mixtures thereof.
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Honda Kenji
Rothgery Eugene F.
Arch Specialty Chemicals, Inc.
Garrett Dawn L.
Krynski William
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