Non-contact temperature measurement of a film growing on a subst

Details Non-contact temperature measurement of a film growing on a subst Non-contact temperature measurement of a film growing on a subst

1991-09-13

1994-12-27

Voeltz, Emanuel T.

Boots, shoes, and leggings

364563, 374120, 374121, 427 10, 505829, 505842, G01J 500

Patent

active

053771265

ABSTRACT:
Apparatus and method for non-contact temperature measurement of a film growing on a substrate which accounts for the change in emissivity due to the change in film thickness. The system employs an adaptively calibrated pyrometer wherein the substrate emittance is continuously computed so that the temperature measurement is accurate regardless of the emittance variation. The new system is easily constructed by adding data processing system software and hardware to conventional pyrometers.

REFERENCES:
patent: 4396640 (1983-08-01), Rocheleau et al.
patent: 4979134 (1990-12-01), Arima et al.
patent: 5118200 (1992-06-01), Kirillov et al.
patent: 5132922 (1992-07-01), Khan et al.
patent: 5155337 (1992-10-01), Sorrell et al.
patent: 5156461 (1992-10-01), Moslehi et al.
patent: 5166080 (1992-11-01), Schietinger et al.
patent: 5188458 (1993-02-01), Thompson et al.
Singh, Rajendra, "Rapid Isothermal Processing," SPIE-The International Society For Optical Engineering, vol. 1189, (Oct. 1989) p. 30.
Reid, J. Michael, "Modeling Of Emissivity Effects For Use In Control Of Rapid Thermal Processing Equipment," (thesis), 1990.
Harris, John Adams, "Temperature Measurement And Control In Rapid Thermal Processing Of Silicon Wafers," (thesis), 1989.
Annual Review of Heat Transfer, C. L. Tien, ed., vol. 3, pp. 115-144, 1990, "Thermal Phenomena In High-Tc Thin-Film Superconductors", M. I. Flik and C. L. Tien.
Pochi Yeh, 1988, "Optical Waves in Layered Media" John Wiley & Sons, New York, pp. 83-101.
Materials Researchy Society Symposium Proceedings, vol. 52 "Rapid Thermal Processing", T. O. Sedgwick, T. E. Seidel, and B. Y. Tsaur, eds.
IEEE Transactions on Semiconductor Manufacturing. vol. 3 No. 4, Nov. 1990 pp. 183-188 "A Global Model For Rapid Thermal Processors", F. Yates Sorrell, John A. Harris, and Ronald S. Gyurcski.
J. Vac. Sci Technol A 8(1) Jan./Feb., 1990, pp. 84-92 "Infrared-laser Interferometric Thermometry: A Nonintrusive Technique For Measuring Semiconductor Wafer Temperature", V. M. Donnelly and J. A. McCaulley.
Appl. Phys. lett 56(10), Mar. 5, 1990, "Silicon Temperature Measurement by Infrared Transmission For Rapid Thermal Processing Applications", pp. 961-963, J. C. Sturm, P. V. Schwartz, and P. M. Garone.
Stone, John M., "Radiation and Optics, An Introduction To The Classical Theory," (McGraw-Hill Book Company, Inc.), pp. 389-419.
Born, Max et al., "Principles of Optics, Electromagnetic Theory Of Propagation, Interference And Diffraction of Light," (Pergamon Press), pp. 51-70.

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