Non-contact measurement of linewidths of conductors in semicondu

Electricity: measuring and testing – Measuring – testing – or sensing electricity – per se – With rotor

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324529, 324716, 324763, G01R 3100, G01R 2700

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active

054850800

ABSTRACT:
A method of measuring the linewidth of an electrical conductor on a semiconductor substrate includes preparing mutually separated test and interconnection areas on a surface of a semiconductor substrate; forming an electrical interconnection conductor on the surface of the substrate in the interconnection area with a substantially uniform linewidth electrically interconnecting elements on the surface; simultaneously with forming the interconnection conductor, forming in the test area a test structure having a plurality of closed loops of the electrical conductor having the same linewidth as the interconnection conductor; measuring the impedance or complex reflection coefficient of the test structure using a head disposed opposite the test area, spaced from the surface, and coupled to the test structure without directly contacting the test structure; and correlating the measured impedance or complex reflection coefficient of the test structure with measurements of geometrically identical structures of conductors having known linewidths to determine the linewidth of the test structure and, thereby, the linewidth of the interconnection conductor.

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Cresswell et al, "Test Structure for the In-Plane Locations of Projected tures With Nanometer-Level Accuracy Traceable to a Coordinate Measurement System", Proceedings of 1993 IEEE International Conference on Microelectric Test Structures, Barcelona Spain, Mar. 1993.

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