Non-absorbing anti-reflective coated (ARC) reticle using thin di

Stock material or miscellaneous articles – Composite – Of quartz or glass

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

65 602, 65 604, 65 605, 65 608, 65DIG8, 428433, 428469, 428698, 428702, 430 5, B32B 1706, C03C 1734

Patent

active

060278153

ABSTRACT:
An anti-reflective reticle and a method by which the anti-reflective reticle is formed. Formed upon a first surface of a transparent substrate is a patterned metal layer. Formed upon the first surface of the transparent substrate including the patterned metal layer is a two-layer dielectric stack. The two layer dielectric stack has a first dielectric layer which is closer to the transparent substrate and a second dielectric layer which is formed directly upon the first dielectric layer. The first dielectric layer has an index of refraction greater than the index of refraction of the transparent substrate or the second dielectric layer. The second dielectric layer has a thickness of about one-quarter the wavelength of reflected light desired to be attenuated or eliminated from the surface of the reticle. In addition, the first dielectric layer is formed completely covering a series of metal features within the patterned metal layer and completely covering portions of the transparent substrate exposed adjoining the series of metal features within the patterned metal layer. Preferably, the second dielectric layer is formed co-extensive with the first dielectric layer.

REFERENCES:
patent: 4557797 (1985-12-01), Fuller et al.
patent: 4919152 (1990-04-01), Ger
patent: 4944443 (1990-07-01), Oddsen et al.
patent: 5125553 (1992-06-01), Oddsen et al.
patent: 5174487 (1992-12-01), Rothfuss et al.
patent: 5194345 (1993-03-01), Rolfson
patent: 5282808 (1994-02-01), Kovac et al.
patent: 5289963 (1994-03-01), McGarry et al.
patent: 5292623 (1994-03-01), Kemp et al.
patent: 5328786 (1994-07-01), Miyazaki et al.
patent: 5354632 (1994-10-01), Dao et al.
patent: 5356064 (1994-10-01), Green et al.
patent: 5364002 (1994-11-01), Green et al.
patent: 5366479 (1994-11-01), McGarry et al.
patent: 5372901 (1994-12-01), Rolfson et al.
patent: 5392978 (1995-02-01), Velez et al.
patent: 5413584 (1995-05-01), Schulze
patent: 5460908 (1995-10-01), Reinberg
patent: 5547474 (1996-08-01), Koleckl et al.
patent: 5589305 (1996-12-01), Tomofuji et al.
patent: 5609977 (1997-03-01), Iwamatsu et al.
patent: 5614336 (1997-03-01), Mikami et al.
patent: 5626586 (1997-05-01), Pistl et al.
patent: 5695502 (1997-12-01), Pier et al.
patent: 5769303 (1998-06-01), Knodel et al.
patent: 5780161 (1998-07-01), Hsu
S. Wolf et al., "Silicon Processing in the VLSI--vol. 1: Process Technology", Lattice Press, Sunset Beach, CA, p. 441, 1986.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Non-absorbing anti-reflective coated (ARC) reticle using thin di does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non-absorbing anti-reflective coated (ARC) reticle using thin di, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-absorbing anti-reflective coated (ARC) reticle using thin di will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-518834

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.