No coat backside wafer grinding process

Abrading – Abrading process – Glass or stone abrading

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

451287, 451388, 451285, B24B 100

Patent

active

056326670

ABSTRACT:
A silicon wafer grinding apparatus for grinding a backside surface of a semiconductor wafer that includes integrated circuit chips patterned on a frontside surface of the wafer. The apparatus includes a plurality of chuck tables that secure a plurality of wafers to be ground. Each chuck table includes a cushioned rubber pad secured to the table and an interface with the frontside surface of the wafer. An organic acid cooling fluid is utilized during the grinding procedure to prevent silicon particles and residue from being adhered to the metal bond pads of the integrated circuit chips.

REFERENCES:
patent: 3342652 (1967-09-01), Reisman et al.
patent: 3740900 (1973-06-01), Youmans et al.
patent: 4009540 (1977-03-01), Uijen
patent: 4183781 (1980-01-01), Eldridge et al.
patent: 4292039 (1981-09-01), Farris et al.
patent: 4343662 (1982-08-01), Gay
patent: 4451972 (1984-06-01), Batinovich
patent: 4510672 (1985-04-01), Yakura
patent: 4597228 (1986-07-01), Koyama et al.
patent: 4654147 (1987-03-01), Bagley
patent: 4693036 (1987-09-01), Mori
patent: 4900363 (1990-02-01), Brahem et al.
patent: 5078801 (1992-01-01), Malik
patent: 5288332 (1994-02-01), Pustilnik et al.
patent: 5329734 (1994-07-01), Yu
patent: 5362681 (1994-11-01), Roberts, Jr. et al.
patent: 5461008 (1995-10-01), Sutherland et al.
S. Mayumi, et al, "Corrosion-Induced Contact Failures in Double-Level AI-Si-Cu Metallization," Journal of the Electrochemical Society, v137, n6, pp. 1861-1867 Jun. 1990.
Wen-Yang Lee, "Reactive Ion Etching Induced Corrision of A1 and A1-Cu Films," Journal of Applied Physics, v 52, n4, pp. 2994-2999, Apr. 1981.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

No coat backside wafer grinding process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with No coat backside wafer grinding process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and No coat backside wafer grinding process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2324979

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.