Nitrogenated evaporable getter devices with high fritting resist

Compositions – Getters or gas or vapor generating materials for electric... – Reactive compositions

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2521816, 2521817, H01J 718

Patent

active

061397687

ABSTRACT:
Nitrogenated evaporable getter devices are disclosed which are resistant to the fritting conditions of the production processes of kinescopes for times of about five hours. A process is also disclosed for the production of these devices. The nitrogenated evaporable getter material comprises: 1) BaAl.sub.4 powder, 2) nickel powder, and 3) iron nitride and/or germanium nitride particles that have been coated with a thin vitreous layer of boron oxide and silicon oxide, formed through a sol-gel process employing a starting solution wherein the atomic ratio between boron and silicon ranges from about 4:1 to 0.75:1.

REFERENCES:
patent: 3768884 (1973-10-01), Della Porta et al.
patent: 3973816 (1976-08-01), Van Bakel et al.
patent: 4077899 (1978-03-01), van Gils
patent: 4127361 (1978-11-01), Hellier et al.
patent: 4203860 (1980-05-01), Ishise
patent: 4323818 (1982-04-01), Madden et al.
patent: 4342662 (1982-08-01), Kimura et al.
patent: 4406972 (1983-09-01), Fransen
patent: 4407657 (1983-10-01), Fransen
patent: 4481441 (1984-11-01), Van Gils
patent: 4486686 (1984-12-01), della Porta
patent: 4504765 (1985-03-01), della Porta
patent: 4642516 (1987-02-01), Ward et al.
patent: 4961040 (1990-10-01), della Porta et al.
patent: 5118988 (1992-06-01), della Porta
Patent Abstracts of Japan, vol. 015., No. 250 (E-1082), Jun. 26, 1991 & JP 03 078928 A, Apr. 4, 1991, abstract.
Patent Abstract of Japan, vol. 003., No. 132 (E-149), Nov. 6, 1979 & JP 54 111751 A, Sep. 1, 1979, abstract.

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