Nitrogen trifluoride-oxygen thermal cleaning process

Details Nitrogen trifluoride-oxygen thermal cleaning process Nitrogen trifluoride-oxygen thermal cleaning process

1997-01-21

1999-01-19

Warden, Jill

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

134 2, 134 2218, 134 36, B08B 900

Patent

active

058610650

ABSTRACT:
A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated nitrogen trifluoride and a source of oxygen at elevated temperatures, typically at the process operation temperature, wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.

REFERENCES:
patent: Re30505 (1981-02-01), Jacob
patent: 4374698 (1983-02-01), Sanders et al.
patent: 4522681 (1985-06-01), Gorowitz et al.
patent: 4568410 (1986-02-01), Thornquist
patent: 4786352 (1988-11-01), Benzing
patent: 4787957 (1988-11-01), Barkanic et al.
patent: 5158644 (1992-10-01), Cheung et al.
patent: 5382316 (1995-01-01), Hills et al.
patent: 5421957 (1995-06-01), Carlson et al.

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