Nitrogen-free anionic and non-ionic surfactants in a process for

Details Nitrogen-free anionic and non-ionic surfactants in a process for Nitrogen-free anionic and non-ionic surfactants in a process for

1976-07-02

1978-01-31

Arnold, Donald J.

Abrasive tool making process, material, or composition

With carbohydrate or reaction product thereof

51308, B24B 100

Patent

active

040707970

ABSTRACT:
Process for making haze-free surfaces of semiconductor bodies which comprs a first step of polishing the surface by means of a polishing agent containing at least one member of the group consisting of quartz, silica, silicates and fluosilicates, and a second step of polishing the surface by means of a polishing agent containing in addition to the above defined agents from 0.1 to 10% by weight calculated on the polishing agent of a nitrogen-free surfactant selected from the group consisting of anionic and non-ionic surfactants, and a mixture thereof.

REFERENCES:
patent: 3458300 (1969-07-01), Duvall
patent: 3540891 (1970-11-01), Muhler
patent: 3576750 (1971-04-01), Muhler
patent: 3715842 (1973-02-01), Tredinnick et al.
patent: 3754941 (1973-08-01), Burke
patent: 3807979 (1974-04-01), Cromwell
patent: 3874129 (1975-04-01), Deckert
patent: 3877183 (1975-04-01), Deckert et al.
patent: 3922393 (1975-11-01), Sears
patent: 3966432 (1976-06-01), Rayner
patent: 4022625 (1977-05-01), Shelton

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