Nitrogen fixation with a high energy laser

Details Nitrogen fixation with a high energy laser Nitrogen fixation with a high energy laser

1978-04-12

1979-09-11

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

250527, B01J 110, B01K 100

Patent

active

041674634

ABSTRACT:
Disclosed is a method and device for the fixation of atmospheric nitrogen ilizing the very high temperature and rapid quenching rates of plasmas produced by the focused beam of a repetitively-pulsed, high energy laser. The irradiance at the focal point of a mirror employed in the nitrogen fixation reaction chamber exceeds that required for plasma production in clear air, namely: 10.sup.9 watts/cm.sup.2 at 10.6 micrometers; consequently, a plasma is produced every time the laser pulses. The laser pulse length being short causes rapid quenching of the plasma thereby preventing decomposition of the nitric oxide formed from a mixture of nitrogen and oxygen introduced at an elevated pressure through an inlet to the nitrogen fixation reaction chamber. The reaction gas mixture containing the nitric oxide is extracted from the reaction chamber through an outlet means. The nitric oxide is subsequently removed by scrubbing with water, or by other extraction techniques well established in the art.

REFERENCES:
patent: 3227642 (1966-01-01), Lemelson
patent: 4025787 (1977-05-01), James et al.

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