Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1999-10-27
2000-05-16
Dees, Jose'G.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 83, 430 5825, G03G 500, G03G 5047, G03G 509
Patent
active
060635347
ABSTRACT:
A nitro group-containing naphthoquinone derivative represented by the following general formula: ##STR1## wherein R is a monovalent hydrocarbon group having a nitro group, and a ring A may be substituted with a substituent.
This compound is a novel substance and is useful as an electron-transporting agent for an electrophotosensitive material. The electrophotosensitive material using the electron-transporting agent is highly sensitive, exhibits favorable repetitive properties, and makes it possible to favorably form images for extended periods of time.
REFERENCES:
patent: 4634654 (1987-01-01), Singer
patent: 4929642 (1990-05-01), Linder et al.
patent: 5679808 (1997-10-01), Mizoguchi et al.
patent: 5718997 (1998-02-01), Bayata et al.
patent: 5863688 (1999-01-01), Wantanabe et al.
patent: 5994012 (1999-11-01), Watanabe et al.
Kang, et al., J. Chem. Soc., Perkin Trans. 1 (1990) (3), pp. 441-445.
Grinev, et al. (CA 55:842f, CAOLD)--Quinones--(XXXIII) condensation of arylnaphthoquinones with Na enolates of acetoacetic and malonic esters and their analogs.
Dees Jose'G.
Mita Industrial Co. Ltd.
Qazi Sabiha N.
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