Nitride semiconductor light emitting device, and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure

Reexamination Certificate

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Reexamination Certificate

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07554122

ABSTRACT:
In a nitride semiconductor light emitting device, a first conductivity type nitride semiconductor layer is provided on a support base and a second conductivity type nitride semiconductor layer is provided on the support base. An active region is provided between the first conductivity type nitride semiconductor layer and the second conductivity type nitride semiconductor layer. The active region includes an InX1AlY1Ga1-X1-Y1N well layer (1>X1>0 and 1>Y1>0) and an InX2AlY2Ga1-X2-Y2N barrier layer (1>X2>0 and 1>Y2>0). An InX3AlY3Ga1-X3-Y3N buffer layer (1>X3>0 and 1>Y3>0) is provided between the active region and the first conductivity type nitride semiconductor layer. A proportion X1of indium in the InX1AlY1Ga1-X1-Y1N well layer is smaller than a proportion X3of indium in the InX3AlY3Ga1-X3-Y3N buffer layer, and a proportion X2of indium in the InX2AlY2Ga1-X2-Y2N barrier layer is smaller than the proportion X3of indium in the InX3AlY3Ga1-X3-Y3N buffer layer.

REFERENCES:
patent: 5828684 (1998-10-01), Van de Walle
patent: 2001/0028064 (2001-10-01), Hirayama et al.
patent: 2004/0261692 (2004-12-01), Dwilinski et al.
patent: 2005/0087753 (2005-04-01), D'Evelyn et al.
patent: 2001-237455 (2001-08-01), None
Chinese Office Action, with English translation, issued in Chinese Patent Application No. CN 200510088496.3, mailed Nov. 9, 2007.

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