Nitride semiconductor light emitting device and fabrication...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction

Reexamination Certificate

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C257S085000, C257S101000

Reexamination Certificate

active

08053794

ABSTRACT:
A nitride semiconductor light-emitting device according to the present invention comprises a first nitride semiconductor layer; an active layer formed on the first nitride semiconductor layer; a second nitride semiconductor layer formed on the active layer; and a third nitride semiconductor layer having AlIn, which is formed on the second nitride semiconductor layer. And a nitride semiconductor light-emitting device comprises a first nitride semiconductor layer; an n-AlInN cladding layer formed on the first nitride semiconductor layer; an n-InGaN layer formed on the n-AlInN cladding layer; an active layer formed on the n-InGaN layer; a p-InGaN layer formed on the active layer; a p-AlInN cladding layer formed on the p-InGaN layer; and a second nitride semiconductor layer formed on the p-AlInN cladding layer.

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Jeon et al., “Lateral Current Spreading in GaN-based light-emitting diodes utilizing tunnel contact junctions,” Applied Phsyics Letters, vol. 78, No. 21, pp. 3265-3267, American Institute of Physics (May 21, 2001).

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