Nitride semiconductor laser device and method for...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S045010, C372S046010

Reexamination Certificate

active

07011982

ABSTRACT:
A group-III nitride semiconductor laser device with excellent optical characteristics and its manufacturing method are provided. The method does not include steps that require high assembly precision. The group-III nitride semiconductor laser device comprises a substrate which has a cut-out portion. A laser facet of a multi-layer body is located near the cut-out portion of the substrate.

REFERENCES:
patent: 5181216 (1993-01-01), Ackerman et al.
patent: 5294815 (1994-03-01), Iechi
patent: 5621746 (1997-04-01), Futatsugi et al.
patent: 5953581 (1999-09-01), Yamasaki et al.
patent: 6603782 (2003-08-01), Nakanishi et al.
patent: 6778568 (2004-08-01), Fukuda et al.
patent: 100 22 879 (2000-12-01), None
patent: 0 593 031 (1994-04-01), None
patent: 1 014 520 (2000-06-01), None
patent: 63-208293 (1988-08-01), None
patent: 2-35788 (1990-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nitride semiconductor laser device and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nitride semiconductor laser device and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitride semiconductor laser device and method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3565890

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.