Nitride semiconductor heterojunction field effect transistor...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

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C257S615000, C257SE29252

Reexamination Certificate

active

08035130

ABSTRACT:
The objective of the present invention is to provide a semiconductor device of a hetero-junction field effect transistor that is capable of obtaining a high output and a high breakdown voltage and a manufacturing method of the same. The present invention is a semiconductor device of a hetero-junction field effect transistor provided with an AlxGa1-xN channel layer with a composition ratio of Al being x (0<x<1) formed on a substrate, an AlyGa1-yN barrier layer with a composition of Al being y (0<y≦1) formed on the channel layer, and source/drain electrodes and a gate electrode formed on the barrier layer, wherein the composition ratio y is larger than the composition ratio x.

REFERENCES:
patent: 2007/0045670 (2007-03-01), Kuraguchi
patent: 2007/0158683 (2007-07-01), Sheppard et al.
patent: 2010/0244041 (2010-09-01), Oishi et al.
patent: 2001-326232 (2001-11-01), None
patent: 2003-243423 (2003-08-01), None
patent: 2004-228481 (2004-08-01), None
patent: 2006-134935 (2006-05-01), None
patent: 2006-222160 (2006-08-01), None
patent: 2007-67240 (2007-03-01), None
Takuma Nanjo, et al.,“Remarkable Breakdown Voltage Enhancement in AlGaN Channel HEMTs”, IEDM 2007, Tech. Digest, 4 pages.
Yasuhiro Okamoto et al., “L-Band High Output AlGaN/GaN Hetero-junction FET on SiC Substrate”, Technical Report of IEICE, The Institute of Electronicl, Information and Communication Engineers, 2002, ED2002-94, 5 pages.

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