Nitride semiconductor element

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure

Reexamination Certificate

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C257S013000, C257S086000, C257S094000, C257S099000, C257S103000

Reexamination Certificate

active

07095051

ABSTRACT:
In a nitride semiconductor device having an active layer12between a first electrically conductive type of layer and a second electrically conductive type of layer, a quantum well structure is adopted in which an active layer12has at least a well layer11formed of a nitride semiconductor containing In and Al and a barrier layer2formed of a nitride semiconductor containing Al, whereby a laser device excellent in emitting efficacy at a short wavelength region is obtained. It is particularly preferable that said well layer1is formed of AlxInyGa1−x−yN (0<x≦1<0<y≦1, x+y<1) and said barrier layer2is formed of AluInvGa1−u−vN (0<u≦1, 0≦v≦1, u+v<1).Such a light emitting device is realized to obtain excellent efficacy in emitting light of short wavelength in a region of 380 nm.

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Shin-ichi Nagahama et al., “Characteristics of Ultravoilet Laser Diodes Composed of Quaternary AlxInyGa (1-x-y)N” Aug. 1, 2002, pp L778-L791.
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Translation of International Preliminary Examination Report; Form PCT/IPEA/409; International Application No. PCT/J2/03052.

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