Nitride semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE33030, C372S045012

Reexamination Certificate

active

07915607

ABSTRACT:
A nitride semiconductor device include an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and an active layer formed between the n-type and p-type nitride semiconductor layers. The active layer has an alternately-layered structure of a plurality of quantum well layers and a plurality of quantum barrier layers, each alternately stacked on each of the quantum well layers. The alternately-layered structure includes a unit multi-layer structure and a thick quantum barrier well. The unit multi-layer structure includes a first quantum well layer, a second quantum well layer formed, a tunneling quantum barrier layer and a crystal quality-improving layer. The thick quantum barrier well may be formed adjacent to the first and second quantum well layers, with a thickness thereof greater than that of the first and second quantum well layers.

REFERENCES:
patent: 6420733 (2002-07-01), Koide et al.
patent: 6744064 (2004-06-01), Lee et al.
patent: 2005/0199892 (2005-09-01), Cho et al.
patent: 2006/0006375 (2006-01-01), Ou et al.
patent: 2006/0086932 (2006-04-01), Kim et al.
patent: 2006/0108528 (2006-05-01), Qiu
patent: 10-2008-0035865 (2008-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nitride semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nitride semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitride semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2763955

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.