Nitride semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

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C257S200000, C257S472000, C257SE29081, C257SE29140

Reexamination Certificate

active

10996440

ABSTRACT:
A nitride semiconductor device, which includes a III-V Group nitride semiconductor layer being composed of a III Group element consisting of at least one of a group containing of gallium, aluminum, boron and indium and V Group element consisting of at least nitrogen among a group consisting of nitrogen, phosphorus and arsenic, including a first nitride semiconductor layer including the III-V Group nitride semiconductor layer being deposited on a substrate, a second nitride semiconductor layer including the III-V Group nitride semiconductor layer being deposited on the first nitride semiconductor and not containing aluminum and a control electrode making Schottky contact with the second nitride semiconductor layer wherein the second nitride semiconductor layer includes a film whose film forming temperature is lower than the first nitride semiconductor layer.

REFERENCES:
patent: 6492669 (2002-12-01), Nakayama et al.
patent: 2003/0082860 (2003-05-01), Yoshida et al.
patent: 2004/0155260 (2004-08-01), Kuzmik
patent: 2005/0285141 (2005-12-01), Piner et al.
patent: 10-335637 (1998-12-01), None
Y. Ohno, et al.; “International Conference on Nitride Semiconductor, Nara, 2003, Tu-P2.067” (p. 375).
Y. Liu, et al.; Growth and characterization of high-quality quaternary AlInGaN epilayers on sapphire;Journal of Crystal Growth259 (2003), pp. 151-157.

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