Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2005-02-01
2005-02-01
Wilson, Allan R. (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S015000, C257S094000
Reexamination Certificate
active
06849864
ABSTRACT:
A nitride semiconductor device including a light emitting device comprises a n-type region of one or more nitride semiconductor layers having n-type conductivity, a p-type region of one or more nitride semiconductor layers having p-type conductivity and an active layer between the n-type region and the p-type region. In such devices, there is provided with a super lattice layer comprising first layers and second layers which are nitride semiconductors having a different composition respectively. The super lattice structure makes working current and voltage of the device lowered, resulting in realization of more efficient devices.
REFERENCES:
patent: 5005057 (1991-04-01), Izumiya et al.
patent: 5146465 (1992-09-01), Khan et al.
patent: 5306662 (1994-04-01), Nakamura et al.
patent: 5578839 (1996-11-01), Nakamura et al.
patent: 5583879 (1996-12-01), Yamazaki et al.
patent: 5585648 (1996-12-01), Tischler
patent: 5585649 (1996-12-01), Ishikawa et al.
patent: 5592501 (1997-01-01), Edmond et al.
patent: 5747827 (1998-05-01), Duggan et al.
patent: 5903017 (1999-05-01), Itaya et al.
patent: 5945689 (1999-08-01), Koike et al.
patent: 6153894 (2000-11-01), Udagawa
patent: 6377596 (2002-04-01), Tanaka et al.
patent: 2 298 735 (1996-09-01), None
patent: 2-288371 (1990-11-01), None
patent: 5-110138 (1993-04-01), None
patent: 5-110139 (1993-04-01), None
patent: 5-183189 (1993-07-01), None
patent: 6-021511 (1994-01-01), None
patent: 6-268257 (1994-09-01), None
patent: 06-268259 (1994-09-01), None
patent: 7-169701 (1995-07-01), None
patent: 07-170017 (1995-07-01), None
patent: 8-023124 (1996-01-01), None
patent: 8-056015 (1996-02-01), None
patent: 8-070139 (1996-03-01), None
patent: 8-203834 (1996-08-01), None
patent: 08-213653 (1996-08-01), None
patent: 8-228048 (1996-09-01), None
patent: 8-250810 (1996-09-01), None
patent: 9-116234 (1997-05-01), None
patent: 9-148678 (1997-06-01), None
patent: 9-232629 (1997-09-01), None
patent: 9-293935 (1997-11-01), None
patent: 9-298341 (1997-11-01), None
patent: 10-93194 (1998-04-01), None
patent: 10-145004 (1998-05-01), None
patent: WO 9711518 (1997-03-01), None
S. Nakamura et al., “Present Status of InGaN/GaN/AlGaN-Based Laser Diodes,” Proceedings of the Second International Conference on Nitride Semiconductors (ICNS '97), 1997, p. 444-446.
T. Shibata et al., “Hydride Vapor Phase Epitaxy Growth of High Quality GaN Bulk Single Crystal by Epitaxial Lateral Overgrowth,” Proceedings of the Second International Conference on Nitride Semiconductors (ICNS '97), 1997, pp. 154-155.
H. Matsushima et al., “Sub-micron Fine Structure of GaN by MOVPE Selective Area Growth (SAG) and Buried Structure by Epitaxial Lateral Overgrowth (ELO),” Proceedings of the Second International Conference of Nitride Semiconductors (ICNS '97), 1997 pp. 492-493.
S. Nakamura et al., “InGaN-Based Multi-Quantum-Well-Structure Laser Diodes,” Jpn. J. Appl. Phys., vol. 35 (1996), pp. L74-L76, Part 2, No. 1B, Jan. 15, 1996S.
Nakamura et al., “In GaN-Based Multi-Quantum-Well-Structure Laser Diodes with Cleaved Mirror Cavity Facets,” Jpn. J. Appl. Phys., vol. 35 (1996), pp. L217-L220, Part 2, No. 2B, Feb. 15, 1996.
S. Nakamura et al., “High-Power, Long-Lifetime InGaN Multi-Quantum-Well-Structure Laser Diodes,” Jpn. J. Appl. Phys., vol. 36 (1997), pp. L1059-L1061, Part 2, No. 8B, Aug. 15, 1997.
F.L. Degertekin et al., “Single mode Lamb wave excitation in thin plates by Hertzian contacts,” Appl. Phys. Lett. 69 (2), pp. 146-148, Jul. 8, 1996.
M. Shao et al., “Radio-frequency . . . ,” Appl. Phys. Lett. 69 (2), pp. 3045-3047, Nov. 11, 1996.
S. Nakamura et al., “Room-temperature continuous-wave operation of InGaN multi-quantum-well structure laser diodes,” Appl. Phys. Lett. 69 (2), pp. 4056-4058, Dec. 23, 1996.
Suemune, Ikuo, “Doping in a superlattice structure: Improved hole activation in wide-gap II-VI materials,” J. Appl. Phys. vol. 67, No. 5 (Mar. 1, 1990), pp. 2364-2369.
M.A. Khan, et al., “Reflective filters based on single-crystal GaN/AlxGa1-xN multilayers deposited using low-pressure metalorganic chemical vapor deposition,” Appl. Phys. Lett. 59 (12), pp. 1449-1451, Sep. 16, 1991.
Nagahama Shinichi
Nakamura Shuji
Senoh Masayuki
Birch & Stewart Kolasch & Birch, LLP
Nichia Chemical Industries Ltd.
Wilson Allan R.
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