Nitride semiconductor and method for manufacturing thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S077000, C257S078000, C257S079000, C257S103000, C257SE21108, C257SE29089, C257SE33032

Reexamination Certificate

active

07834343

ABSTRACT:
A P-type nitride semiconductor and a method for manufacturing the same are provided. A nitride semiconductor includes a P-type nitride layer formed on a active layer, wherein the P-type nitride layer is a P-type nitride layer with the group 4 element doped.

REFERENCES:
patent: 5909036 (1999-06-01), Tanaka et al.
patent: 6930329 (2005-08-01), Koide
patent: 7314672 (2008-01-01), Kimura
patent: 2003/0010993 (2003-01-01), Nakamura et al.
patent: 2004/0095977 (2004-05-01), Nakamura et al.
patent: 2004/0185643 (2004-09-01), Chiyo et al.
patent: 2006/0006399 (2006-01-01), Nakamura et al.
patent: 2007/0148923 (2007-06-01), Kim et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nitride semiconductor and method for manufacturing thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nitride semiconductor and method for manufacturing thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitride semiconductor and method for manufacturing thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4208440

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.