Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-10-05
2010-11-16
Tran, Long K (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S077000, C257S078000, C257S079000, C257S103000, C257SE21108, C257SE29089, C257SE33032
Reexamination Certificate
active
07834343
ABSTRACT:
A P-type nitride semiconductor and a method for manufacturing the same are provided. A nitride semiconductor includes a P-type nitride layer formed on a active layer, wherein the P-type nitride layer is a P-type nitride layer with the group 4 element doped.
REFERENCES:
patent: 5909036 (1999-06-01), Tanaka et al.
patent: 6930329 (2005-08-01), Koide
patent: 7314672 (2008-01-01), Kimura
patent: 2003/0010993 (2003-01-01), Nakamura et al.
patent: 2004/0095977 (2004-05-01), Nakamura et al.
patent: 2004/0185643 (2004-09-01), Chiyo et al.
patent: 2006/0006399 (2006-01-01), Nakamura et al.
patent: 2007/0148923 (2007-06-01), Kim et al.
Birch & Stewart Kolasch & Birch, LLP
LG Innotek Co. Ltd.
Tran Long K
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