Nitride etch bath

Details Nitride etch bath Nitride etch bath

1984-10-04

1985-12-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156626, 156627, 159 28R, B44C 122, C03C 1500, C03C 2506

Patent

active

045590982

ABSTRACT:
An acid bath including an inner vessel, having non-opaque wall sections, is sealingly mounted within an outer housing with electric heating elements mounted therebetween. A condensing lid is mounted to enclose the inner vessel to prevent escape of acid fumes therefrom, an optical-type sensor is mounted to transmit and receive optical signals through the non-opaque walls to determine liquid level within the vessel.

REFERENCES:
patent: 3677848 (1972-07-01), Stoller et al.
patent: 4233106 (1980-11-01), Goffredo
IBM Technical Disclosure Bulletin, vol. 15, No. 2, Jul. 1972, Controlling Etching Conditions of Silicon Nitride Si.sub.3 N.sub.4, Miller et al., pp. 667-668.
IBB Technical Disclosure Bulletin, vol. 17, No. 7, Dec. 1974, Multiple Sensor, Enol-Point Etch Detect System, Dhaliwal et al., pp. 1946-1947.

Affiliated with

Also associated with

Rating

Nitride etch bath does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nitride etch bath, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitride etch bath will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2173082