Nitride-based semiconductor light emitting device and method...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor

Reexamination Certificate

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C438S478000

Reexamination Certificate

active

07871845

ABSTRACT:
Provided is a nitride-based semiconductor light emitting device having increased efficiency and power characteristics and method of manufacturing the same. The method may include forming a sacrificial layer on a substrate, forming a passivation layer on the sacrificial layer, forming a plurality of masking dots of a metal nitride on the passivation layer, laterally epitaxially growing a nitride-based semiconductor layer on the passivation layer using the masking dots as masks, forming a semiconductor device on the nitride-based semiconductor layer, and wet etching the sacrificial layer to separate and/or remove the substrate from the semiconductor device.

REFERENCES:
patent: 6051849 (2000-04-01), Davis et al.
patent: 2005/0247950 (2005-11-01), Nakamura et al.
patent: 2006/0255341 (2006-11-01), Pinnington et al.
patent: 2007/0184637 (2007-08-01), Haskell et al.
patent: 2000-021789 (2000-01-01), None
patent: 10-2006-0093528 (2006-08-01), None
Office Action dated Apr. 23, 2008 for corresponding Korean Application No. 10-2006-0085897 and English translation thereof.

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