Nitride based semiconductor device using nanorods and...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission

Reexamination Certificate

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Details

C257S012000, C257S013000, C257S094000, C257SE29069, C257SE29070, C257SE29071, C257SE29245

Reexamination Certificate

active

07737429

ABSTRACT:
Disclosed are a nitride based semiconductor device, including a high-quality GaN layer formed on a silicon substrate, and a process for preparing the same. A nitride based semiconductor device in accordance with the present invention comprises a plurality of nanorods aligned and formed on the silicone substrate in the vertical direction; an amorphous matrix layer filling spaces between nanorods so as to protrude some upper portion of the nanorods; and a GaN layer formed on the matrix layer.

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patent: WO 02/45140 (2002-06-01), None
patent: WO 2004/057663 (2004-07-01), None
United States Office Action issued in U.S. Appl. No. 12/497,060 dated Dec. 29, 2009.

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