Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular semiconductor material
Reexamination Certificate
2004-01-30
2008-03-25
Dickey, Thomas (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
With particular semiconductor material
C257S183000, C257SE21126, C257SE29081
Reexamination Certificate
active
07348606
ABSTRACT:
A method of producing nitride based heterostructure devices by using a quaternary layer comprised of AlInGaN. The quaternary layer may be used in conjunction with a ternary layer in varying thicknesses and compositions that independently adjust polarization charges and band offsets for device structure optimization by using strain compensation profiles. The profiles can be adjusted by altering profiles of molar fractions of In and Al.
REFERENCES:
patent: 4661175 (1987-04-01), Kuphal et al.
patent: 5523589 (1996-06-01), Edmond et al.
patent: 5851905 (1998-12-01), McIntosh et al.
patent: 5981977 (1999-11-01), Furukawa et al.
patent: 6316793 (2001-11-01), Sheppard et al.
patent: 6359292 (2002-03-01), Sugawara et al.
patent: 6563141 (2003-05-01), Dawson et al.
patent: 09-27639 (1997-01-01), None
patent: 411243251 (1999-09-01), None
“The Influence of the Strain-Induced Electric Field on the Charge Distribution in GaN-AIN-GaN Structure,” A.D. Bykhovski et al., Journal of Applied Physics, vol. 74, No. 11, Dec. 1, 1993, pp. 6734-6739.
“Pyroelectricity in Gallium Nitride Thin Films,” A.D. Bykhovski et al., Applied Physics Letters, vol. 69, No. 21, Nov. 18, 1996, pp. 3254-3256.
“Pyroelectric and Piezoelectric Properties of GaN-Based Materials,” M.S. Shur et al., MRS Internet J. Nitride Semicond. Res. 4S1, G1.6 (1999), pp. 1-12.
“Piezoeffect and Gate Current in AlGaN/GaN High Electron Mobility Transistors,” R. Gaska et al., Applied Physics Letters, vol. 71, No. 25, Dec. 22, 1997, pp. 3673-3675.
“Two-Dimensional Electron-Gas Density in AlxGa1-xN/GaN Heterostructure Field-Effect Transistors,” N. Maeda et al., Applied Physics Letters, vol. 73, No. 13, Sep. 28, 1998, pp. 1856-1858.
“Piezoelectric Charge Densities in AlGaN/GaN HFETs,” P.M. Asbeck et al., Electronic Letters, vol. 33, No. 14, Jul. 3, 1997, 1230-1231.
“Spontaneous Polarization and Piezoelectric Constants of III-V Nitrides,” F. Bernardini et al., Physical Review B, vol. 56, No. 16, Oct. 15, 1997, pp. R10024-R10027.
“Piezoelectric Doping and Elastic Strain Relaxation in AlGaN-GaN Heterostructure Field Effect Transistors,” A. D. Bykhovski et al., Applied Physics Letters, vol. 73, No. 24, Dec. 14, 1998, pp. 3577-3579.
“Ferroelectric Semiconductors,” V. M. Fridkin, Russia (1976), p. 90 (pp. 64-65 in English version).
“Lattice and Energy Band Engineering in AlInGaN/GaN/ Heterostructures,” M. A. Khan et al., Applied Physics Letters, vol. 76, No. 9, Feb. 28, 2000, pp. 1161-1163.
“Electron Mobility in Modulation-Doped AlGaN-GaN Heterostructures,” R. Gaska et al., Applied Physics Letters, vol. 74, No. 2, Jan. 11, 1999, pp. 287-289.
“High Pinch-off Voltage AlGaN-GaN Heterostructure Field Effect Transistor,” M. S. Shur et al., Proceedings of ISDRS-97, Charlottesville, VA, Dec. 1997, pp. 377-380.
“Optoelectronic GaN-Based Field Effect Transistors,” M. S. Shur et al., SPIE Vol. 2397, pp. 294-303.
“Current/Voltage Characteristic Collapse in AlGaN/GaN Heterostructure Insulated Gate Field Effect Transistors at High Drain Bias,” M. A. Khan et al., Electronic Letters, vol. 30, No. 25, Dec. 8, 1994, pp. 2175-2176.
Gaska Remigijus
Khan Muhammad Asif
Shur Michael
Yang Jinwei
Dickey Thomas
Erdem Fazli
Hoffman Warnick & D'Alessandro LLC
LaBatt John W.
Sensor Electronic Technology, Inc.
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