Data processing: artificial intelligence – Neural network – Learning task
Reexamination Certificate
2008-07-22
2008-07-22
Holmes, Michael B (Department: 2129)
Data processing: artificial intelligence
Neural network
Learning task
Reexamination Certificate
active
11646205
ABSTRACT:
There is provided a system and method for pattern recognition of an endpoint curve for a dry etch process. The system trains a neural network with a group of training curves corresponding to the dry etch process, wherein the training curves contain normal and abnormal features. The system receives an endpoint curve at the neural network representing a dry etch process and detects an abnormal feature in the endpoint curve.
REFERENCES:
patent: 4317698 (1982-03-01), Christol et al.
patent: 4945257 (1990-07-01), Marrocco, III
patent: 5220202 (1993-06-01), Isono et al.
patent: 5343081 (1994-08-01), Nakamura
patent: 5393994 (1995-02-01), Kobayashi et al.
patent: 5467883 (1995-11-01), Frye et al.
patent: 5475341 (1995-12-01), Reed
patent: 5589692 (1996-12-01), Reed
patent: 5653894 (1997-08-01), Ibbotson et al.
patent: 5677783 (1997-10-01), Bloom et al.
patent: 5737496 (1998-04-01), Frye et al.
patent: 5859964 (1999-01-01), Wang et al.
patent: 5961923 (1999-10-01), Nova et al.
patent: 6320200 (2001-11-01), Reed et al.
patent: 6329139 (2001-12-01), Nova et al.
patent: 6340588 (2002-01-01), Nova et al.
patent: 6608386 (2003-08-01), Reed et al.
patent: 6641746 (2003-11-01), Houge et al.
patent: 6844582 (2005-01-01), Ueda et al.
patent: 6889216 (2005-05-01), Nugent
patent: 7015336 (2006-03-01), Reed et al.
patent: 7028017 (2006-04-01), Nugent
patent: 7039619 (2006-05-01), Nugent
patent: 7107252 (2006-09-01), Nugent
Towards real time fault identification in plasma etching using neural networks Zhang, B.; May, G.S.; Advanced Semiconductor Manufacturing Conference and Workshop, 1998. 1998 IEEE/SEMI Sep. 23-25, 1998 pp. 61-65 Digital Object Identifier 10.1109/ASMC.1998.731394.
Holmes Michael B
Jianq Chyun IP Office
Macronix International Co. Ltd.
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