Negatively operating photoresist composition, with radiation-abs

Details Negatively operating photoresist composition, with radiation-abs Negatively operating photoresist composition, with radiation-abs

1986-04-30

1988-08-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430196, 430197, 430325, G03C 160, G03C 170, G03C 171

Patent

active

047627670

ABSTRACT:
New aminoazobenzene derivatives of the general formula I ##STR1## in which R and R' independently of one another denote hydrogen, alkyl with up to 4 C atoms or halogen,

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patent: 4287289 (1981-09-01), Sato
patent: 4311773 (1982-01-01), Koneko et al.
patent: 4349619 (1982-09-01), Kamoshida et al.
patent: 4407927 (1983-10-01), Kamoshida et al.
patent: 4414314 (1983-11-01), Kaplan et al.

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