Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-06-28
1995-02-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430177, 430180, 430181, 430191, 430196, 430270, G03F 7012, G03F 7021, G03F 7023
Patent
active
053894910
ABSTRACT:
A negative working resist composition comprising (a) an alkali-soluble resin, (b) an aromatic compound having at least two groups of the formula: --OCH.sub.2 OR.sup.1 wherein R.sup.1 is alkyl or aralkyl, (c) a photoacid generator, and (d) a solvent, can form fine patterns with high resolution when exposed to deep UV, KrF excimer laser light, etc. due to high light transmittance and high sensitivity.
REFERENCES:
patent: 4343885 (1982-08-01), Reardon, Jr.
SPIE, vol. 1262, Advances in Resist Technology and Processing VII (1990) pp. 16-25, 49-59, 60-71.
Endo Masayuki
Tani Yoshiyuki
Urano Fumiyoshi
Yasuda Takanori
Bowers Jr. Charles L.
Matsushita Electric - Industrial Co., Ltd.
Wako Pure Chemical Industries Ltd.
Young Christopher G.
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