Negative-working radiation-sensitive resist composition

Details Negative-working radiation-sensitive resist composition Negative-working radiation-sensitive resist composition

1993-04-23

1994-11-29

Tucker, Philip

Compositions

Radiation sensitive

430325, 430270, G03C 100, G03C 500

Patent

active

053687833

ABSTRACT:
Disclosed is a novel negative-working radiation-sensitive resist composition useful in the photolithographic patterning works of resist layers on substrate surfaces in the manufacture of semiconductor devices and capable of giving a finely patterned resist layer with high resolution and having an excellently orthogonal cross sectional profile of the line-wise patterned resist layer with an outstandingly high sensitivity to various actinic rays. The composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a cresol novolac resin, (b) a specific alkoxymethylated amino resin, e.g., methoxymethylated melamine resin, and (c) a specific triazine compound in a limited weight proportion.

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patent: 4469778 (1984-09-01), Iwayanagi et al.
patent: 5034304 (1991-07-01), Feely
patent: 5204225 (1993-04-01), Feely
patent: 5258265 (1993-11-01), Slater et al.
patent: 5266440 (1993-11-01), Zampini
Journal of Electrochemical Society, 118, 669 (1971).

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