Negative-working radiation-sensitive mixture, and radiation-sens

Details Negative-working radiation-sensitive mixture, and radiation-sens Negative-working radiation-sensitive mixture, and radiation-sens

1992-04-20

1993-07-13

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Image layer portion transfer and element therefor

430280, 430270, 430273, 430325, 430260, 430330, 430258, 522 50, G03F 7004, G03F 7039, G03F 732

Patent

active

052272761

ABSTRACT:
A negative-working radiation-sensitive mixture containing

REFERENCES:
patent: 3692560 (1972-09-01), Rosenkranz et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 5057397 (1991-10-01), Miyabe et al.
C. G. Willson, "Organic Resist Materials--Theory and Chemistry", Introduction to Microlithography ACS Symp. Ser. 219, 1983, pp. 88-159.
J. V. Crivello, "Possibilities for Photoimaging Using Onium Salts", Polymer Engineering and Science, vol. 23, No. 17, Dec. 1983, pp. 953-956.
F. M. Houlihan et al., "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE vol. 920, 1988, pp. 67-73.

Affiliated with

Also associated with

Rating

Negative-working radiation-sensitive mixture, and radiation-sens does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative-working radiation-sensitive mixture, and radiation-sens, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative-working radiation-sensitive mixture, and radiation-sens will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2311196