Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-05-19
1994-04-12
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 430176, 430278, G03F 7021, G03F 709
Patent
active
053024877
ABSTRACT:
The invention describes a solvent mixture for photohardenable compositions, which includes
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Stiehler et al, Chemical Abstracts, vol. 79, No. 26, p. 361 (No. 151655z "Photoresist Lacquers") Dec. 31, 1973.
Arneth Reinhold
Frass Werner
Hehl Eberhard
Jung Guenter
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
Young Christopher G.
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