Negative-working photosensitive coating solution containing phot

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430175, 430176, 430278, G03F 7021, G03F 709

Patent

active

053024877

ABSTRACT:
The invention describes a solvent mixture for photohardenable compositions, which includes

REFERENCES:
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patent: 4387151 (1983-06-01), Bosse et al.
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patent: 4659645 (1987-04-01), Frommeld et al.
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patent: 4764450 (1988-08-01), Ruckert et al.
patent: 4845008 (1989-07-01), Nishioka et al.
patent: 4929533 (1990-05-01), Nishikawa et al.
Stiehler et al, Chemical Abstracts, vol. 79, No. 26, p. 361 (No. 151655z "Photoresist Lacquers") Dec. 31, 1973.

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