Negative working photoresist material comprising a N-vinyl monom

Details Negative working photoresist material comprising a N-vinyl monom Negative working photoresist material comprising a N-vinyl monom

1975-08-15

1977-05-03

Louie, Jr., Won H.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 67, 96 87R, 96115P, 96 90R, G03C 500, G03C 168

Patent

active

040212424

ABSTRACT:
A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.

REFERENCES:
patent: 2791578 (1957-05-01), Drechsel et al.
patent: 3374094 (1968-03-01), Wainer et al.
patent: 3525616 (1970-08-01), Hackmann et al.
patent: 3563749 (1971-02-01), Munder et al.
patent: 3769023 (1973-10-01), Lewis et al.
patent: 3820993 (1974-06-01), Lewis et al.
patent: 3883351 (1975-05-01), Lewis

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