Negative-working photoresist coating composition

Details Negative-working photoresist coating composition Negative-working photoresist coating composition

1983-08-26

1985-06-25

Michl, Paul R.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

5253331, 5253325, 525376, C08L 900

Patent

active

045255237

ABSTRACT:
There is proposed a negative-working photoresist coating composition of an improved resolution, which comprises a cyclized polyisoprene having a weight-average molecular weight of 10,000 to 100,000 and a molecular weight distribution of not more than 1.9, an organic solvent of the cyclized polyisoprene, and a bisazido compound as a crosslinking agent.

REFERENCES:
patent: 2852379 (1958-03-01), Hepher et al.
patent: 2940853 (1960-07-01), Saguara et al.
patent: 4115316 (1978-09-01), Burke, Jr.
Agnihotri et al., "Structure and Behavior of Cyclized Rubber Photoresist", Photographic Science and Engineering, vol. 16, No. 6, Nov.-Dec. 1972.

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