Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1998-03-17
2000-04-04
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430303, 101452, 101467, G03F 7023, G03F 730
Patent
active
060459638
ABSTRACT:
A negative waterless plate contains a sheet substrate; a radiation sensitive imaging layer composed of a diazido naphthaquinone ester or amide compound, such as diazido naphthaquinone sulfonate of a phenolic resin, and a polyurethane prepared by reacting a di-isocyanate and a diol; and a silicone layer. The planographic printing plate is imagewise exposed to actinic radiation through a negative original to form exposed areas of the imaged layer which are soluble or dispersible in a developer liquid. After imaging exposure, the developer liquid is applied which penetrates the silicone layer and dissolves the areas exposed to the radiation. The coating areas not exposed by the radiation remain intact. During this development procedure, areas of the silicone layer overlying the exposed areas are removed along with the underlying soluble areas to produce an imaged planographic printing plate having uncovered ink receptive areas and complimentary ink repellent areas of the silicone layer. In use, the developed plate is mounted on a dry planographic printing press containing only a lithographic ink; and used to print a positive image on conventional print stock.
REFERENCES:
patent: 2766118 (1956-10-01), Sus et al.
patent: 2767092 (1956-10-01), Schmidt et al.
patent: 2772972 (1956-12-01), Herrick, Jr. et al.
patent: 2859112 (1958-11-01), Sus et al.
patent: 2907665 (1959-10-01), Fraher et al.
patent: 3046111 (1962-07-01), Schmidt et al.
patent: 3046115 (1962-07-01), Schmidt et al.
patent: 3046118 (1962-07-01), Schmidt et al.
patent: 3046119 (1962-07-01), Sus et al.
patent: 3046121 (1962-07-01), Schmidt
patent: 3046122 (1962-07-01), Sus et al.
patent: 3046123 (1962-07-01), Sus et al.
patent: 3061430 (1962-10-01), Uhlig et al.
patent: 3102809 (1963-09-01), Endermann et al.
patent: 3106465 (1963-10-01), Neugebaner et al.
patent: 3511178 (1970-05-01), Curtin
patent: 3635709 (1972-01-01), Kobayashi
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3933495 (1976-01-01), Kondo et al.
patent: 4184006 (1980-01-01), Hockemeyer et al.
patent: 4342820 (1982-08-01), Kinashi et al.
patent: 4358522 (1982-11-01), Fujita et al.
patent: 4842990 (1989-06-01), Herrmann et al.
patent: 4853313 (1989-08-01), Mori et al.
patent: 5631119 (1997-05-01), Shinozaki et al.
patent: 5866294 (1999-02-01), Oguni et al.
patent: 5919600 (1999-07-01), Huang et al.
Do Thi
Goodman Richard
Huang Jianbing
Chu John S.
Kodak Polychrome Graphics LLC
LandOfFree
Negative-working dry planographic printing plate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Negative-working dry planographic printing plate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative-working dry planographic printing plate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-363570