Negative-working diazo type photoreproduction having improved D-

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Diazo-type process – i.e. – producing dye image by reacting...

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430157, 430177, 430179, G03C 158, G03C 160, G03C 518

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active

043071716

ABSTRACT:
Negative-working diazography material is comprised of (i) at least one hexafluorophosphate diazonium salt adapted to photolytically cleave into an acid catalyst, (ii) at least one acid labile enolic, preferably arylenolic blocked-coupler adapted to be converted in the presence of acid to an active azo-coupling component, and (iii) an effective amount of at least one additive such as benzotriazole, urea, thiourea and derivatives thereof. The additives are believed to react with the acid released during imaging to the extent that migration thereof into the areas which have not been exposed to light is reduced or eliminated. The reduction in the migration of the liberated acid improves the D-min and line acuity of the image obtained from the formulation and the presence of the additive provides a means for decreasing the photo speed of the formulation.

REFERENCES:
patent: 2727820 (1955-12-01), Botkir
patent: 3365293 (1968-01-01), Haefeli et al.
patent: 3453112 (1969-07-01), Schaeffer
patent: 3512978 (1970-05-01), Lubar
patent: 4252884 (1981-02-01), Bennett
Chemical Abstracts, #89:120,859w, 1978 [Belgian Pat. 860,040-2/1978 (Bennett, E].
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 292-296.

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