Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1983-06-02
1985-09-17
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430175, 430176, 430179, 430512, 430522, G03C 160, G03F 708, G03F 726
Patent
active
045420858
ABSTRACT:
A negative working light-sensitive composition and a lithographic printing plate using the composition are described. The printing plate is comprised of a hydrophilic support and a thin layer of a negative working light-sensitive composition on the support. The light-sensitive composition contains a light-sensitive diazo compound and a compound capable of increasing absorption over the light-sensitive wavelength region of the composition with increasing exposure time.
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patent: 3512983 (1970-05-01), Watanabe et al.
patent: 3778274 (1973-12-01), Inoue et al.
patent: 3891516 (1975-06-01), Chu
patent: 4126466 (1978-11-01), Roos
patent: 4144067 (1979-03-01), Ruckert et al.
Aono Koichiro
Aotani Yoshimasa
Nishioka Akira
Takahashi Hiroshi
Tokunaga Fumihiro
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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