Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2002-06-17
2008-01-29
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S270100, C430S905000
Reexamination Certificate
active
07323284
ABSTRACT:
A negative type radiation sensitive resin composition comprising:(A) an alkali-soluble resin containing the polymerized unit of a polymerizable unsaturated compound having a phenolic hydroxyl group and having a weight average molecular weight of 4,100 to 20,000 and a weight average molecular weight
umber average molecular weight ratio of more than 1.25 to not more than 2.00;(B) a radiation sensitive acid generating agent; and(C) an acid crosslinking agent.This composition can be used with an alkali developer having a normal concentration, can form a high-resolution rectangular line-and-space resist pattern, and provides a chemically amplified negative type resist which is free from a resist pattern defect (bridging or chip line) after development and has excellent sensitivity, developability and dimensional fidelity.
REFERENCES:
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4889789 (1989-12-01), Stahlhofen
patent: 5663035 (1997-09-01), Masuda et al.
patent: 5700625 (1997-12-01), Sato et al.
patent: 6455223 (2002-09-01), Hatakeyama et al.
patent: 6511783 (2003-01-01), Uenishi
patent: 6528233 (2003-03-01), Adegawa
patent: 6673512 (2004-01-01), Uenishi et al.
patent: 2002/0187422 (2002-12-01), Angelopoulos et al.
patent: 37 11 264 (1988-10-01), None
patent: 0 133 216 (1984-07-01), None
patent: 0 212 482 (1986-08-01), None
patent: 0 613 050 (1994-08-01), None
patent: 1117002 (2001-07-01), None
patent: 01-293339 (1989-11-01), None
patent: 02-015270 (1990-01-01), None
patent: 05-034922 (1993-02-01), None
patent: 6-301200 (1994-10-01), None
patent: 07-120924 (1995-05-01), None
patent: 07-311463 (1995-11-01), None
patent: 08-044061 (1996-02-01), None
patent: 8-292559 (1996-11-01), None
patent: 09166870 (1997-06-01), None
patent: 10-186661 (1998-07-01), None
patent: 10-069082 (1998-10-01), None
Ichinohe Daigo
Kai Toshiyuki
Chu John S.
JSR Corporation
Merchant & Gould P.C.
Raimund Christopher W.
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