Negative type photoresist developing apparatus

Details Negative type photoresist developing apparatus Negative type photoresist developing apparatus

1986-03-20

1987-08-25

Mathews, A. A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134100, 134151, G03D 504

Patent

active

046889183

ABSTRACT:
A developer is drawn up from a developer tank (1) by a developer pump (5) and after the flow rate of the developer has been regulated by a developer flow rate control valve (12), the developer passes through a developer flow meter (14) and reaches a pipe (16). A rinse solution is drawn up from a rinse solution tank (2) by a rinse solution pump (6) and after the flow rate of the rinse solution has been regulated by a rinse flow rate control valve (13), the rinse solution attains the pipe (16) through a rinse solution flow meter (15). The developer and the rinse solution are mixed in the pipe (16) so that the mixture is sprayed from a nozzle (17) to a negative type photoresist (11) placed on a specimen table (10). A control unit (18) controls the developer flow rate control valve (12) and the rinse solution flow rate control valve (13) based on the respective flow rate data from the developer flow meter (14) and the rinse solution flow meter (15) so that the flow rate of the developer and that of the rinse solution may be changed continuously from the start of development to the end thereof. As a result, the volume of the exposed portions of the negative type photoresist does not undergo considerable change.

REFERENCES:
patent: 3604331 (1971-09-01), Parlin
patent: 4121236 (1978-10-01), Welp et al.
patent: 4197000 (1980-04-01), Blackwood
patent: 4564280 (1986-01-01), Fukuda

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