Negative-type acetalized polyvinyl alcohol resist sensitive to i

Details Negative-type acetalized polyvinyl alcohol resist sensitive to i Negative-type acetalized polyvinyl alcohol resist sensitive to i

1982-10-05

1985-12-03

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Nonsilver image

430270, 430296, 430907, 430909, 20415914, G03C 171

Patent

active

045566194

ABSTRACT:
An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula: ##STR1## wherein: R.sup.1 represents a halogen-containing residue of an aldehyde or a ketone; R.sup.2 represents a hydrogen atom, which may partially be substituted with an acetyl group; R.sup.3 represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.

REFERENCES:
patent: 2929710 (1960-03-01), Martin
patent: 2980535 (1961-04-01), Schroeter
patent: 4478977 (1984-10-01), Sperry et al.

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