Negative resist material

Details Negative resist material Negative resist material

1987-07-27

1989-05-02

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

528 32, 528 42, 556450, 556466, C08G 7706

Patent

active

048269433

ABSTRACT:
A negative resist material consists of poly (silsesquioxane) of weight average molecular weight 2000 or more represented by the general formula (1):

REFERENCES:
patent: 4481049 (1984-11-01), Reichmanis et al.
patent: 4564576 (1986-01-01), Saigo et al.
patent: 4702990 (1987-10-01), Tanaka et al.
Journal of the Electrochemical Soc., Sep. 1983, pp. 1962-1964, "Copolymers of Trimethylsilyl Styrene with Chloromethyl Styrene for a Bi-Layer Resist System", M. Suzuki et al.
M. Suzuki et al., "Copolymers of Trimethylsilylstyrene with Chloromethylstyrene for a Bi-Layer Resist System," J. Electrochem. Soc., pp. 1962-1964, 9/83.
6001 Chemical Abstracts, vol. 96, (1983, May, No. 18, Columbus, Ohio, vol. 9, No. 239, (p. 391), (1962), Sep. 25, 1985, "Resist Material".
"Syntheses de polysiloxanes organofonctionnels, 2, Les poly[(halomethylmethyl)siloxane]s et leurs modeles", Makromol. Chem., 184, pp. 1179-1187, (1983).

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