Negative photosensitive resin composition, negative...

Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image

Reexamination Certificate

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Details

C430S259000, C430S270100, C430S325000

Reexamination Certificate

active

06913867

ABSTRACT:
The present invention provides a negative photosensitive resin composition comprising (A) a photocurable resin having a photosensitive group or groups crosslinkable by light irradiation, (B) a photoacid generator and (C) a photosensitizer which is a benzopyran condensed ring compound capable of increasing photosensitivity to visible light with a wavelength of 480 nm or more,a negative photosensitive dry film prepared by applying the photosensitive resin composition to a surface of support film, followed by drying, to form a photosensitive resin layer, anda method of forming a pattern using the resin composition or the dry film.

REFERENCES:
patent: 5098806 (1992-03-01), Robillard
patent: 5801212 (1998-09-01), Okamoto et al.
patent: 6033826 (2000-03-01), Urano et al.
patent: 6106999 (2000-08-01), Ogiso et al.
patent: 6140025 (2000-10-01), Imai et al.
patent: 6277541 (2001-08-01), Uno et al.
patent: 09-138502 (1997-05-01), None
patent: 11-212252 (1999-08-01), None
patent: 2000-035665 (2000-02-01), None
patent: 2000-056450 (2000-02-01), None
patent: 2000-275823 (2000-10-01), None
Aldrich Handbook of Fine Chemicals adn Laboratory Equipmen 2000-2001, p. 453.
JPO machine translation of JP 09-138502.
Taiwanese Office Action dated Feb. 25, 2003.
International Search Report dated Dec. 25, 2001.

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