Negative photosensitive polyimide polymer and uses thereof

Details Negative photosensitive polyimide polymer and uses thereof Negative photosensitive polyimide polymer and uses thereof

2011-08-02

2011-08-02

Seidleck, James (Department: 1765)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

C528S170000, C528S172000, C528S173000, C528S174000, C528S188000, C528S189000, C430S283100, C430S325000, C525S420000

Reexamination Certificate

active

07989578

ABSTRACT:
The present invention relates to a negative photosensitive polyimide polymer having a repeating unit of formula (1) as a polymerized unit:wherein G, Q and P* are as defined in the specification. The polyimide polymer of the present invention is developable in an aqueous alkaline solution, and has the properties associated with an insulating layer and photoresist.

REFERENCES:
patent: 6010825 (2000-01-01), Hagen et al.
patent: 6610815 (2003-08-01), Hata et al.

Affiliated with

Also associated with

Rating

Negative photosensitive polyimide polymer and uses thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative photosensitive polyimide polymer and uses thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative photosensitive polyimide polymer and uses thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2700705